Aluminium Nitride Substrate
Aluminium Nitride (Aln) yog cov khoom siv hluav taws xob siab tshaj plaws rau cov khoom siv hluav taws xob {}} Cov khoom siv hluav taws xob tseem ceeb rau high-fais fab ntaub ntawv thov.
Cov Khoom Siv Tseem Ceeb Ntawm Txhuas Nitride Substrates
| Ntiag tug | Tus nqi / Kev Ntsuas | Qhov tseem ceeb |
|---|---|---|
| Thermal conductivity | 170-220 W/m·K | Superior rau alumina (20-30 w / min kay) |
| Hluav taws xob tiv thaiv hluav taws xob | >10¹⁴ ω ω ω.nm cm | Cov tshuaj insulator zoo heev |
| Coefficient ntawm thermal expansion | 4.5 PPM / degree | Ntais ntawv silicon (4.2 ppm / degree) |
| Dielectric lub zog | 15-20 kv / hli | High voltage tiv thaiv |
| Lub zog flexural | 300-400 mpa | Lub tshuab ua haujlwm zoo |
| Qhov siab tshaj plaws kev pab kub | >1, 000} degree | Kub Ceev |
Cov ntsiab lus tseem ceeb ntawm Aln
✓ Cov Kev Tswj Xyuas Thiaj Siab Thermal (5-10 x zoo dua alumina)
Match Zoo rau cov silicon / Siic semiconductors
Kev ntseeg siab muaj zog ua haujlwm hauv qhov chaw hnyav
✓ Ib qho kev nyab xeeb ib puag ncig ib puag ncig rau beryllia (boo)
Cov ntawv qhia zoo heev tshaj plaws rau RF daim ntaub ntawv
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Aln Ceramic substratesYam Khoom: Aln Ceramic substratesNtau
Khoom siv: ALN
Qhov loj me: 12 {0 hli x 120mm, thickness ntau dua los yog sib npaug rau 0.1mm
Cov duab: Xwmfab thiab Mekas
Process: Dry pressing or...
Cov ntawv thov ntawm txhuas nitride (aln) substrates
| Kev Lag Luam Lag Luam | Cov Ntawv Qhia Tseem Ceeb | Cov piv txwv tshwj xeeb |
|---|---|---|
| Cov Khoom Siv Hluav Taws Xob & Khoom Siv Hluav Taws Xob | Lub Tog Hluav Taws Xob Electronics Ntim LED substrates RF / microwave Cheebtsam Laser thermal kev tswj hwm |
IGBTS, Mosfets High-power / UV LEDs 5g Cheebtsam Diode cua sov dab dej |
| Automotive & Aerospace | Lub Tsheb Fais Lub Tsheb Kev tham xov tooj Qhov Chaw Siv |
Lub Hwjchim Modules 5G Huag Chaw Nres Nkoj Satellite com cov tshuab |
| Muaj & Lub Zog | Kev Tsim Txaj Semiconductor Sensor thev naus laus zis Lub zog tshuab |
Cov Khoom Siv Ua Si High-temp Sensors Hnub Ci / Cua Fais Tshuab |
Tsim cov txheej txheem ntawm aln subtrates
| Txheej Txheem Theem | Cov hau kev & tsis ua haujlwm | Cov Lus Qhia Kev |
|---|---|---|
| 1.} Hmoov synthesis | Ncaj qha nitridation Txo Kev Txo Carbothermal |
Al + n₂ @ 800-1200} degree Al₂o₃ + C + N₂ → 2aln + 3 CO |
| 2.} Txoj kev sib haum | Daim kab xev casting QHUAV TUG Isostatic nias |
0.25-1 mm tuab Yooj Yim Duab Cov geometries complex |
| 3. sintering | Qhov ntsuas kub ntau Sintering AIDS Huab cua |
1700-1900 degree Y₂o₃ / CAO (3-5%) N₂ / txo cov roj |
| 4.} position-ua | Laser Machining Nto Kho Lub xov |
Precision Txiav TI / Pd / AU Metallization Ra <0.1μm Polish |
Sib piv cov khoom ntawm ceramic substrates
| Khoom | Thermal conductivity (w / min k) | CTE (PPM / degree) | Nqi | Qhov Tseem Ceeb |
|---|---|---|---|---|
| Tus ALN | 170-220 | 4.5 | Siab | Qhov zoo tshaj plaws uas tsis-toxic thermal kev kawm |
| AL₂O₃ | 20-30 | 8.0 | Qi | Nqi Nqi Ua Lag Luam |
| Tus mos | 250-300 | 7.5 | Siab heev | Siab tshaj plaws conductivity (toxic) |
| Si₃n₄ | 20-30 | 3.2 | Nruab nrab | Qhov Zoo Tshaj Plaws Tshuab Muaj Zog |
Peb yog tus kws tshaj lij Aluminium Nitride Substrate Settrate Chaw tsim tshuaj paus kev lag luam {}} Nitride tus nqi sib tw ntawm peb lub hoobkas.












