Aluminium Nitride Substrate

Aluminium Nitride (Aln) yog cov khoom siv hluav taws xob siab tshaj plaws rau cov khoom siv hluav taws xob {}} Cov khoom siv hluav taws xob tseem ceeb rau high-fais fab ntaub ntawv thov.

Cov Khoom Siv Tseem Ceeb Ntawm Txhuas Nitride Substrates

Ntiag tug Tus nqi / Kev Ntsuas Qhov tseem ceeb
Thermal conductivity 170-220 W/m·K Superior rau alumina (20-30 w / min kay)
Hluav taws xob tiv thaiv hluav taws xob >10¹⁴ ω ω ω.nm cm Cov tshuaj insulator zoo heev
Coefficient ntawm thermal expansion 4.5 PPM / degree Ntais ntawv silicon (4.2 ppm / degree)
Dielectric lub zog 15-20 kv / hli High voltage tiv thaiv
Lub zog flexural 300-400 mpa Lub tshuab ua haujlwm zoo
Qhov siab tshaj plaws kev pab kub >1, 000} degree Kub Ceev

 

Cov ntsiab lus tseem ceeb ntawm Aln

✓ Cov Kev Tswj Xyuas Thiaj Siab Thermal (5-10 x zoo dua alumina)
Match Zoo rau cov silicon / Siic semiconductors
Kev ntseeg siab muaj zog ua haujlwm hauv qhov chaw hnyav
✓ Ib qho kev nyab xeeb ib puag ncig ib puag ncig rau beryllia (boo)
Cov ntawv qhia zoo heev tshaj plaws rau RF daim ntaub ntawv

  • Aln Ceramic substrates
    Yam Khoom: Aln Ceramic substrates
    Khoom siv: ALN
    Qhov loj me: 12 {0 hli x 120mm, thickness ntau dua los yog sib npaug rau 0.1mm
    Cov duab: Xwmfab thiab Mekas
    Process: Dry pressing or...
    Ntau

Cov ntawv thov ntawm txhuas nitride (aln) substrates

Kev Lag Luam Lag Luam Cov Ntawv Qhia Tseem Ceeb Cov piv txwv tshwj xeeb
Cov Khoom Siv Hluav Taws Xob & Khoom Siv Hluav Taws Xob Lub Tog Hluav Taws Xob Electronics Ntim
LED substrates
RF / microwave Cheebtsam
Laser thermal kev tswj hwm
IGBTS, Mosfets
High-power / UV LEDs
5g Cheebtsam
Diode cua sov dab dej
Automotive & Aerospace Lub Tsheb Fais Lub Tsheb
Kev tham xov tooj
Qhov Chaw Siv
Lub Hwjchim Modules
5G Huag Chaw Nres Nkoj
Satellite com cov tshuab
Muaj & Lub Zog Kev Tsim Txaj Semiconductor
Sensor thev naus laus zis
Lub zog tshuab
Cov Khoom Siv Ua Si
High-temp Sensors
Hnub Ci / Cua Fais Tshuab

 

Tsim cov txheej txheem ntawm aln subtrates

Txheej Txheem Theem Cov hau kev & tsis ua haujlwm Cov Lus Qhia Kev
1.} Hmoov synthesis Ncaj qha nitridation
Txo Kev Txo Carbothermal
Al + n₂ @ 800-1200} degree
Al₂o₃ + C + N₂ → 2aln + 3 CO
2.} Txoj kev sib haum Daim kab xev casting
QHUAV TUG
Isostatic nias
0.25-1 mm tuab
Yooj Yim Duab
Cov geometries complex
3. sintering Qhov ntsuas kub ntau
Sintering AIDS
Huab cua
1700-1900 degree
Y₂o₃ / CAO (3-5%)
N₂ / txo cov roj
4.} position-ua Laser Machining
Nto Kho
Lub xov
Precision Txiav
TI / Pd / AU Metallization
Ra <0.1μm Polish

 

Sib piv cov khoom ntawm ceramic substrates

Khoom Thermal conductivity (w / min k) CTE (PPM / degree) Nqi Qhov Tseem Ceeb
Tus ALN 170-220 4.5 Siab Qhov zoo tshaj plaws uas tsis-toxic thermal kev kawm
AL₂O₃ 20-30 8.0 Qi Nqi Nqi Ua Lag Luam
Tus mos 250-300 7.5 Siab heev Siab tshaj plaws conductivity (toxic)
Si₃n₄ 20-30 3.2 Nruab nrab Qhov Zoo Tshaj Plaws Tshuab Muaj Zog

Peb yog tus kws tshaj lij Aluminium Nitride Substrate Settrate Chaw tsim tshuaj paus kev lag luam {}} Nitride tus nqi sib tw ntawm peb lub hoobkas.